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Plasma Etching Equipment Product List and Ranking from 5 Manufacturers, Suppliers and Companies | IPROS GMS

Last Updated： Aggregation Period:Sep 02, 2026～Sep 29, 2026
This ranking is based on the number of page views on our site.

Plasma Etching Equipment Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 02, 2026～Sep 29, 2026
This ranking is based on the number of page views on our site.

  1. プラズマ・サーモ・ジャパン Kanagawa//Electronic Components and Semiconductors
  2. 片桐エンジニアリング Kanagawa//Other manufacturing
  3. 神港精機 東京支店 Tokyo//Industrial Machinery
  4. 4 三友製作所 テクノセンタ Ibaraki//Industrial Machinery
  5. 4 シナノ精機 Niigata//Manufacturing and processing contract
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Plasma Etching Equipment Product ranking

Last Updated： Aggregation Period:Sep 02, 2026～Sep 29, 2026
This ranking is based on the number of page views on our site.

  1. High-Density Radical Cleaning Solution プラズマ・サーモ・ジャパン
  2. CCP plasma etching device 'CCP-T60M/B2M' 片桐エンジニアリング
  3. Plasma etching device "EXAM" sample testing now accepting applications. 神港精機 東京支店
  4. Sanyu Manufacturing Co., Ltd. Company Profile 三友製作所 テクノセンタ
  5. 4 Wire and tube etching device シナノ精機

Plasma Etching Equipment Product List

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Plasma etching device "EXAM" sample testing now accepting applications.

Plasma etching device "EXAM" sample testing now accepting applications.

A compact batch-type plasma etching device that supports sub-micron etching and features process support through sample testing.

Supports etching of submicron Si oxide films in batch type. Compatible not only with SiN and Si-based thin films but also with high melting point metals and difficult-to-etch materials. Ideal for processing niche devices such as vertical etching of quartz and fine processing of thick photoresist. Actively supports a wide range of applications from ashing to cleaning through a multi-step process enabled by plasma mode switching.

  • Etching Equipment
  • Other physicochemical equipment
  • Plasma Generator
  • Plasma Etching Equipment

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CCP plasma etching device 'CCP-T60M/B2M'

CCP plasma etching device 'CCP-T60M/B2M'

High-precision and high-reliability oxide film microfabrication! Selectively generating radicals from process gases.

The "CCP-T60M/B2M" is a parallel plate etching device that achieves high precision and high reliability in oxide film microfabrication. It selectively generates radicals from process gases and applies 60MHz power to the upper electrode to obtain low electron temperature and high-density plasma. Additionally, it is equipped with a sequence program that constantly maintains appropriate etching process conditions. 【Features】 ■ Parallel plate etching device ■ Achieves high precision and high reliability in oxide film microfabrication ■ Selectively generates radicals from process gases ■ Applies 60MHz power to the upper electrode ■ Equipped with a sequence program *For more details, please refer to the PDF materials or feel free to contact us.

  • Etching Equipment
  • Plasma Etching Equipment

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Wire and tube etching device

Wire and tube etching device

Processing that is stronger than UV treatment but weaker than blasting or polishing is possible. It is suitable for processing elongated workpieces, compact, and has low running costs.

- Can process workpieces with weak mechanical strength - Non-contact treatment that does not damage the workpiece - Does not use liquids - Can process not only metals but also resins - Only Ar gas and water are required for the process - Does not produce dust or waste - Can be installed in clean rooms (excluding vacuum pumps)

  • Other processing machines
  • Plasma Etching Equipment

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Sanyu Manufacturing Co., Ltd. Company Profile

Sanyu Manufacturing Co., Ltd. Company Profile

With cultivated skills and a new sensibility, we will continue to advance into the new era!

Sanyu Manufacturing Co., Ltd. is a manufacturing company that produces medical analytical instruments, accessories related to electron microscopes, and tools for semiconductor failure analysis. Since its establishment, the company has focused on precision machining, and the technology cultivated there has shaped our technical foundation. By maintaining a consistent production system from design, machining, to assembly and adjustment, we are able to respond to customers' demands for short delivery times. Currently, the majority of our production is related to medical analytical instruments, but in recent years, we have also been engaged in technology development aimed at the next generation. We aim to anticipate our customers' needs and continuously act as challengers, contributing to the advancement of science and the creation of the future. 【Business Activities】 ■ Manufacturing of accessories related to electron microscopes ■ Manufacturing of semiconductor failure analysis tools ■ Precision machining ■ Manufacturing of analytical instrument-related products *For more details, please download the PDF or feel free to contact us.

  • Other semiconductor manufacturing equipment
  • Contract manufacturing
  • Plasma Etching Equipment

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High-Density Radical Cleaning Solution

High-Density Radical Cleaning Solution

Generates 50 to 100 times more radicals compared to similar technologies from other companies, providing a damage-free process!

The high-density radical cleaning process can completely remove residues such as photoresist and polymers without damaging delicate devices or complex structures. Furthermore, for fine structures such as medical implants, our unique plasma source using remote plasma allows for the removal of residues that could not be completely eliminated by wet processes. Additionally, processing can be performed at both high and low temperatures for complex shapes using high-density radical flux. 【Features】 ■ Flexible processing over a wide temperature range ■ High selectivity and uniformity in the process ■ Capability to completely clean samples with complex shapes *For more details, please feel free to contact us.

  • Other contract services
  • Plasma Etching Equipment

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